红外窄带滤光片采用多膜系结构，通过精密镀膜工艺制备的只允许特定波长、特定带宽的光线透过的滤光片，主要用于红外气体检测、荧光分析等领域。
精密镀膜工艺制备
红外窄带滤光片采用多膜系结构，通过精密镀膜工艺制备
保证特定气种的检测精度
多膜系结构，保证特定带宽、波长光线通过，保证特定气种的检测精度
Specifications
Description | 5020NBP-240 |
Center Wavelength | 5020±40nm |
Half-peak Width | 240±20nm |
Peak transmittance | ≥85% |
Blocking | 1500-11000nm |
Substrate | CZ-Si |
Thickness | 0.5mm |
Size | 100±0.2mm dia |
Clear Aperture | 98mm dia |
Coating Method | Electron Beam Depostion |
Specifications
Description | 4480BPF-620 |
Center Wavelength | 4480±70nm |
Half-peak Width | 620±60nm |
Peak transmittance | ≥85% |
Blocking | 1500-11000nm |
Substrate | CZ-Si |
Thickness | 0.5mm |
Size | 100±0.2mm dia |
Clear Aperture | 98mm dia |
Coating Method | Electron Beam Depostion |
Specifications
Description | 3900NBP-138 |
Center Wavelength | 3900±50nm |
Half-peak Width | 138±15nm |
Peak transmittance | ≥85% |
Blocking | 1500-11000nm |
Substrate | CZ-Si |
Thickness | 0.5mm |
Size | 100±0.2mm dia |
Clear Aperture | 98mm dia |
Coating Method | Electron Beam Depostion |
Specifications
Description | 4260NBP-180 |
Center Wavelength | 4260±40nm |
Half-peak Width | 180±20nm |
Peak transmittance | ≥85% |
Blocking | 1500-11000nm |
Substrate | CZ-Si |
Thickness | 0.5mm |
Size | 100±0.2mm dia |
Clear Aperture | 98mm dia |
Coating Method | Electron Beam Depostion |
Specifications
Description | 3400NBP-180 |
Center Wavelength | 3400±50nm |
Half-peak Width | 180±20nm |
Peak transmittance | ≥85% |
Blocking | 1500-11000nm |
Substrate | CZ-Si |
Thickness | 0.5mm |
Size | 100±0.2mm dia |
Clear Aperture | 98mm dia |
Coating Method | Electron Beam Depostion |
Specifications
Description | 10600NBP-240 |
Center Wavelength | 10600±100nm |
Half-peak Width | 240±50nm |
Peak transmittance | ≥70% |
Blocking | 2000-18000nm |
Substrate | CZ-Si |
Thickness | 0.5mm |
Size | 100±0.2mm dia |
Clear Aperture | 98mm dia |
Coating Method | Electron Beam Depostion |
